A‑Gas Electronic Materials has expanded its portfolio with the addition of mr‑P 22G, a positive‑tone grayscale photoresist ...

As demand grows across micro-optics, MEMS and advanced surface engineering, traditional lithography approaches are being ...

Myrias process uses the same NIL manufacturing tools as the incumbent polymer/nanoparticle composites, and offers ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

ASML, Applied Materials and Lam Research are three semiconductor-equipment names powering global chip production.

With the increasing functional demands of micro- and nano-devices, there is a growing need for complex micro/nano-architectures featuring high spatial resolution and tunable depth profiles.

As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...

Higher density fan-out packages are moving toward more complex structures with finer routing layers, all of which requires more capable lithography equipment and other tools. The latest high-density ...

ASML is the dominant leader in the semiconductor lithography market, and its EUV system sales represented 32% of overall revenues for the company in 2019. ASML dominates the semiconductor lithography ...